Physics, Chemistry and Technology of Solid State Gas Sensor Devices

Of related interest... LASER IONIZATION MASS ANALYSIS Edited by Akos Vertes, Renaat Gijbels, and Fred Adams Edited by three of the field's leading authorities and featuring contributions from thirteen chemists, this book offers a comprehensive look at the new hardware and investigative possibilities of this form of analysis. The book clearly links theory with applications as well as hardware with hard science. Among topics covered are lasers in mass spectrometry, including instrumentation basic to ion generation for mass analysis; methods of using low and medium laser irradiance; high laser irradiance regime; exotic applications of laser ionization mass spectrometry in space research. 1993 (0-471-53673-3) 584 pp. STATISTICAL METHODS IN ANALYTICAL CHEMISTRY --Peter C. Meier and Richard E. Zünd Designed to address the practical day-to-day needs of lab chemists, this practical guide demonstrates the ways in which statistics can be used effectively in analytical work. Chapters 1 and 2 present classical statistical techniques, illustrating them in the context of simple situations. Chapter 3 expands the discussion into ancillary techniques, such as exploratory data analysis, made possible with computing. Chapter 4 presents a number of complex examples that might confront the analyst, while emphasizing the conflicting demands imposed on a possible solution. Chapter 5 presents core sections of programs which complement the equations. Complete with a floppy disk of ready-made programs and data files, here is a clear, real-world introduction to maximizing statistical tools in the lab. 1993 (0-471-58454-1) 352 pp. PHOTOCHEMICAL VAPOR DEPOSITION--J. G. Eden Here is an extremely useful overview of photochemical vapor deposition, both its characteristics and potential. The book focuses on the properties of films that have been created by this versatile method and the conditions under which they are grown. The author works from the position that while photochemical vapor deposition (photo-CVD) is not the solution to all low-temperature deposition methodologies, it does provide an added dimension of flexibility to and control over the growth process and has proven to be valuable for those materials and growth steps in device fabrication that are sensitive to the processing temperature. Whenever applicable, the properties of electronic devices incorporating photo-CVD films are presented and numerous tables detail the deposition parameters as well as electrical and structural properties of the films of specific materials. 1992 (0-471-55083-3) 208 pp.